Use of U.S. Department of Energy Facilities

If an outside researcher wishes to use a User Facility at a U.S. Department of Energy national laboratory, the user’s institution must conclude an agreement with the national laboratory.

Facilities at Brookhaven National Laboratory, Oak Ridge National Laboratory and Fermi National Accelerator Laboratory

Tokyo Institute of Technology (Tokyo Tech) has concluded User Facility Use Agreements (Non-Proprietary User Agreements) with Brookhaven National Laboratory (BNL), Oak Ridge National Laboratory (ORNL), and Fermi Fermi National Accelerator Laboratory (Fermilab) have concluded Non-Proprietary User Agreements for the use of the User Facility.

Please refer to the following website and attachments for an overview of the facilities and procedures available at the above laboratories.

Since it is necessary to keep track of the use of the facilities by the University’s faculty members under this agreement, faculty members who are permitted to use the facilities of the above-mentioned institute in the future are requested to contact us with the following information at the contact information below.

  • Affiliation, title, and name of person authorized to use the information
  • Facility Name
  • Term of Use
  • Purpose of Use

Facilities of National Laboratories under the Department of Energy other than BNL, ORNL and Fermilab

If a faculty member needs to use the facilities of a national research institute under the Department of Energy other than those listed above, the faculty member is required to contact the institute and obtain permission to use the institute’s facilities. However, it is expected that a Non-Proprietary User Agreement between the University and the institute will be required for actual use of the institute’s facilities.

For inquiries, please contact

Industry-Academia Collaboration Planning Group, Industry-Academia Collaboration Division, Research Promotion Department
ext : 3817
MAIL : san.kik [at]jim.titech.ac.jp

*Please replace [at]with @ in the email address.